PolySilane (silicon based material) / Fine Materials Business

Thermosetting grade OGSOL SI-20 series

This series is a network type polysilane that has a silanol group (Si-OH) at the end. When heated, this polysilane is cured, making crosslinks with other reactive compounds such as epoxy. It is possible to suppress changes in the film thickness. In addition, even when cured films are heated, they do not show very much coloration and maintain a high transparency.

Basic structure

Polymer with the compounds shown below as the basic structure

     
Polyphenylcillin Image Polyalkylcillin Image
     
Polyphenylcillin   Polyalkylcillin

Polyalkylcillin

Polyalkylcillin Image
   
Polysilane : SI-20-12
Epoxy resin : Cresol novolak epoxy resin (ECN)
Coating solution : Solid content : Weight ratio 1:1, 40 wt% cellosolve acetate solution
Curing condition : 80℃ 1hr → (Temperature rise 45 min) →200℃ 1hr

Example of usage

  • Transparent coating for LCD
  • Semiconductor coating material

Physical properties of cured film made from polysilane and epoxy resin

  Polysilane / epoxy resin (For reference)
Acid anhydride / epoxy resin
Dielectric properties
(100 MHz)
Relative dielectric constant 2.9 3.6
Dielectric loss tangent 0.02 0.04
Glass transition temperature (TMA) 180 97
Refractive index (D line) 1.64 1.61
Contact angle (°) 87 70
Heat resistance (℃) 5% thermal reduction temperature 342 337
10% thermal reduction temperature 380 359
20% thermal reduction temperature 458 382

Acid anhydride : Methyl tetrahydro phthalic anhydride (MTHPA)

Physical properties (representative properties)

Grade SI-20-12 SI-20-10 SI-20-21 (Newly developed product)
Characteristics
  • Standard type
  • Excellent hardenability
  • Standard type
  • Low metal content (15 ppm)
  • Standard type
  • Low metal content (5 ppm)
Molecular weight Mn 1000 1100 1100
Mw 1300 1500 1500
Solubility (20 wt%) PGMEA
MEK  
Ethyl lactate ×  
c-hexanone
PGME ×  
Butyl acetate  
i-propanol × ×  
NMP  
THF
Xylene  
Toluene ×
Anisole  
Cellosolve acetate  
MIKB  
Dichloromethane  
Monochlorobenzene  

10 wt% for SI-20-21
◎ : Completely dissolved  ○ : Dissolve  × : Not dissolved

Newly developed product OGSOL SI-20-21

Thermosetting reaction of polysilane and epoxy resin

Polysilane  : SI-20-21
Epoxy resin  : Cresol novolak epoxy resin (ECN)
Catalyst  : 2-methylimidazole
Coating solution  : Epoxy equivalence: Hydroxyl equivalent 1:1, 40 wt% PGMEA solution (hydroxyl equivalent of SI-20-21 : estimated value 750)
Curing condition  : 80℃ → (Temperature rise 30 min) → 180℃ 1hr
  Polysilane / epoxy resin (For reference)∗1
Acid anhydride / epoxy resin
Transmittance rate (400 nm) 95.6 96.8
Residual film ratio after curing (%) 100.5 94.2
Heat resistance∗2 Transmittance rate (400 nm) 88.3 68.0
Residual film ratio (%) 101.5 91.1

∗1 Acid anhydride : methyl tetrahydro phthalic anhydride (MTHPA)
∗2 Cured films are heated (250℃, 1hr)
∗∗Evaluation results with a film thickness of about 2 μm

graph Image

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