
This series is a network type polysilane that has a silanol group (Si-OH) at the end. When heated, this polysilane is cured, making crosslinks with other reactive compounds such as epoxy. It is possible to suppress changes in the film thickness. In addition, even when cured films are heated, they do not show very much coloration and maintain a high transparency.
Basic structurePolymer with the compounds shown below as the basic structure
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Polyalkylcillin
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Example of usage
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Physical properties of cured film made from polysilane and epoxy resin
∗Acid anhydride : Methyl tetrahydro phthalic anhydride (MTHPA) |
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| Grade | SI-20-12 | SI-20-10 | SI-20-21 (Newly developed product) | |
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| Characteristics |
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| Molecular weight | Mn | 1000 | 1100 | 1100 |
| Mw | 1300 | 1500 | 1500 | |
| Solubility∗ (20 wt%) | PGMEA | ◎ | ◎ | ◎ |
| MEK | ◎ | ◎ | ||
| Ethyl lactate | ◎ | × | ||
| c-hexanone | ◎ | ◎ | ◎ | |
| PGME | ◎ | × | ||
| Butyl acetate | ◎ | ◎ | ||
| i-propanol | × | × | ||
| NMP | ◎ | ◎ | ||
| THF | ◎ | ◎ | ○ | |
| Xylene | ◎ | ◎ | ||
| Toluene | ◎ | ◎ | × | |
| Anisole | ◎ | ◎ | ||
| Cellosolve acetate | ◎ | ◎ | ||
| MIKB | ◎ | ◎ | ||
| Dichloromethane | ◎ | ◎ | ||
| Monochlorobenzene | ◎ | ◎ | ||
∗10 wt% for SI-20-21
◎ : Completely dissolved ○ : Dissolve × : Not dissolved
Newly developed product OGSOL SI-20-21
| Polysilane | : SI-20-21 |
|---|---|
| Epoxy resin | : Cresol novolak epoxy resin (ECN) |
| Catalyst | : 2-methylimidazole |
| Coating solution | : Epoxy equivalence: Hydroxyl equivalent 1:1, 40 wt% PGMEA solution (hydroxyl equivalent of SI-20-21 : estimated value 750) |
| Curing condition | : 80℃ → (Temperature rise 30 min) → 180℃ 1hr |
| Polysilane / epoxy resin | (For reference)∗1 Acid anhydride / epoxy resin |
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| Transmittance rate (400 nm) | 95.6 | 96.8 | |
| Residual film ratio after curing (%) | 100.5 | 94.2 | |
| Heat resistance∗2 | Transmittance rate (400 nm) | 88.3 | 68.0 |
| Residual film ratio (%) | 101.5 | 91.1 | |
∗1 Acid anhydride : methyl tetrahydro phthalic anhydride (MTHPA)
∗2 Cured films are heated (250℃, 1hr)
∗∗Evaluation results with a film thickness of about 2 μm
