PolySilane (silicon based material) / Fine Materials Business

Optical patterning grade OGSOL SI-10 series

  • When separated by UV radiation, this material shows the patterning of different physical properties between the exposed part and the unexposed part.
  • The refractive index is as high as about 1.70.
  • The basic structure of this series is polymethyl phenylsilane (PMPS) and, in addition, it is denatured in a unique way to improve solubility and compatibility with other materials.

Basic structure

PMPS 

Changes in physical properties caused by UV radiation (SI-10-10)

Characteristics Unexposed part Exposed part
Refractive index (589 nm) 1.70 1.60
Contact angle of water (°) 90 85

Example of usage

  • Optical waveguide
  • Special photoresist
  • Transparent overcoat

Changes in absorption spectra caused by UV radiation (SI-10-10)

Changes in absorption spectra caused by UV radiation (SI-10-10) Image 

Physical properties (representative properties)

Grade SI-10-10 SI-10-20
Characteristics
  • Standard polysilane
  • Good solubility
  • High sensitivity
  • Thermosetting with other reactive
    compounds is possible.
Molecular weight Mn 5600 1100
Mw 22100 1800
Thin film physical properties Refractive index
(589 nm)		 1.7 1.71
Dielectric constant
(10 kHz)		 2.7 —
Dielectric loss tangent
(10 kHz)		 0.0008 —
Solubility (10 wt%) i-propanol × ×
THF ○ ○
PGME × ×
MEK × ×
c-hexanone ○ ○
Toluene ○ ○
PGMEA × ○
Ethyl lactate × ×

○ : Dissolved  × : Not dissolved

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