OGSOL SI-10 series Optical patterning grade --Fine materials business/Osaka Gas Chemicals Co., Ltd.

When separated by UV radiation, this material shows the patterning of different physical properties between the exposed part and the unexposed part.
The refractive index is as high as about 1.70.
The basic structure of this series is polymethyl phenylsilane (PMPS) and, in addition, it is denatured in a unique way to improve solubility and compatibility with other materials.

Basic structure

PMPS

Characteristics	Unexposed part	Exposed part
Refractive index (589 nm)	1.70	1.60
Contact angle of water (°)	90	85

Changes in absorption spectra caused by UV radiation (SI-10-10) Image

Grade		SI-10-10	SI-10-20
Characteristics		Standard polysilane Good solubility	High sensitivity Thermosetting with other reactive compounds is possible.
Molecular weight	Mn	5600	1100
Molecular weight	Mw	22100	1800
Thin film physical properties	Refractive index (589 nm)	1.7	1.71
	Dielectric constant (10 kHz)	2.7	—
	Dielectric loss tangent (10 kHz)	0.0008	—
Solubility (20 wt%)	PGMEA	△	◎
	MEK	△	◎
	Ethyl lactate	×	×
	c-hexanone	◎	◎
	PGME	×	×
	Butyl acetate	△	◎
	i-propanol	×	×
	NMP	◎	◎
	THF	◎	◎
	Xylene	◎	◎
	Toluene	◎	◎
	Anisole	◎	◎
	Cellosolve acetate	△	◎
	MIKB	×	◎
	Dichloromethane	○	◎
	Monochlorobenzene	◎	◎

◎ : Completely dissolved ○ : Dissolved △ : Dissolved a little × : Not dissolved